Mar 6, 2014

[[Optical Component]] Epitaxial growth of in-plane nanowires and nanowire devices

Exemplary embodiments provide semiconductor nanowires and nanowire devices/applications and methods for their formation. In embodiments, in-plane nanowires can be epitaxially grown on a patterned substrate, which are more favorable than vertical ones for device processing and three-dimensional (3D) integrated circuits. In embodiments, the in-plane nanowire can be formed by selective epitaxy...



source Optical Component patent applications http://ift.tt/1iguiuc

via

No comments:

Post a Comment